In united states intellectual property law a mask work is a two or three dimensional layout or topography of an integrated circuit ic or chip ie. Layout designs topographies of integrated circuits are a field in the protection of intellectual property. Semiconductor Integrated Circuits Layout Design Sicld Act Ece547 Ic Design Layout University Of Maine Microwind A Cmos Layout Tool About us sicld act. Integrated circuits layout . Under the layout designs of integrated circuits act the owner has the right to prevent the copying and commercial exploitation of an original layout design of an ic. Since integrated circuit layout is more functional than ornamental design patent protection is generally inapplicable to integrated circuits. The owner can exercise his rights under the layout designs of integrated circuits act by taking legal action against the infringi...
